Cvd/Pecvd Furnace
PECVD is to generate plasma by means of glow discharge and other methods, glow discharge plasma: High electron density 109-1012cm3, The temperature of electron gas is 10-100 times higher than that of ordinary gas molecules, a new preparation technology for the growth of thin-film materials is achieved by chemically reacting gaseous substances containing thin-film components.
Contact us
Specification
Through reactive gaseous discharge, the reaction characteristics of non-equilibrium plasma are effectively used, and the energy supply mode of the reaction system is fundamentally changed. The low-temperature thermal plasma chemical vapor deposition method has all the advantages of the gas phase method, and the process flow is simple.
