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1500℃ Plasma Enhancement CVD
PECVD    View:729    date:2016/09/20    Back

1500 Plasma Enhancement CVD

Purpose

1500 three-zone PE-CVD( Plasma Enhanced Chemical Vapor Deposition) tube furnace system, consists of 500W RF plasma source, 1500 three-zone tube furnace, multi channels precision mass flow meter with gas mixing tank, and high-quality vacuum system.

The PE-CVD furnace is an ideal and affordable tool to deposit SiC thin films, graphene or grow nanowire from a gas state (vapor) to a solid state.

Feature

Maximum Temperature 1500

Continuous Working Temperature 1400

Three Temperature Zone controlled by three  temperature control with 30-segement  

programmable 

Length of each heating zone :200mm 

Length of whole heating zone:600mm

With a pair of stainless steel vacuum flange, which include a quartz observing window and with liquid injection orifice

  

 

 

Type

Max. Temperature

()

Tube Diameter

mm)

Length of Heating

mm)

Uniform Temperature Zone

mm

Length of Tube

mm

Outer Size(mm)

Power

Voltage

Material of Tube

Net Weight

KG

L

W

H

OTF-1500X-III-PE

1500

50--100

200+200+200

100+100+100

1500

1900

600

1490

11KG

AC:220V 50/60H

High Purity Quartz

240

 

 

 

 

 

 

 

  

RF Power Output Power

RF Frequency

Reflection Power

Match

RF Interface

Cooling

Power Supply

Noise

Gas Flow Meter

MFC 1

Gas Flow Meter

MFC 2

Gas Flow Meter

MFC 3

Gas Flow Meter

MFC 4

5 -500W  ± 1%

13.56 MHz

± 0.005% .

200W

Automatic

50 Ω

N-type

Air Cooling

AC208-240V

50/60Hz

<50 dB

0~100sccm

0~200sccm

0~200 sccm

0~500 sccm