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  • 1500℃ Plasma Enhancement CVD
  • 1500℃ Plasma Enhancement CVD
  •      1500℃ Plasma Enhancement CVD Purpose 1500℃ three-zone PE-CVD( Plasma Enhanced Chemical Vapor Deposition) tube furnace system, consists of 500W RF plasma source, 1500℃ three-zone tube furnace, multi channels precision mass flow meter with gas mixing tank, and high-quality vacuum syst..
  • 1700℃ CVD System
  • 1700℃ CVD System
  •     Purpose Tube furnace CVD system, equipped with twin-rotary-vane vacuum pump, with four channels precision mass flow-controllers, the maximum temperature is up to 1700℃, vacuum up to 5×10-2 Torr, it can mix 1-4 gases. The furnace is new tool to research a CVD coating of variety of thin film. ..
  • PE-CVD (Plasma Enhanced Chemical Vapor Deposition) Furnace
  • PE-CVD (Plasma Enhanced Chemical Vapor Deposition) F..
  •      PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high-quality mechanical pump. The PE-CVD furnace is an ideal and affordable..
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